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The 2014 Symposium SiO2, Advanced Dielectrics and Related Devices is the 10th edition of a series that began in 1996 in Agelonde (France). SiO2 Symposia take place every 2 years. The series is an international forum on the science and technology of silica-based systems, also including new related dielectrics and device applications. Recent SiO2 Conference was held in Hyeres (France) in 2012.

The main objective of this symposium is to provide an overview of the state of the art in the physics and chemistry of SiO2 and of novel dielectric materials in the microelectronics, optics and photonics fields.
A further objective is to enhance informal exchange and collaboration between scientists. Participation of young researchers (PhD) is especially encouraged. Their corresponding conference fees will be moderate to allow them to contribute and to present their work.

 Symposium History

1996 Agelonde, France
1998 L'Aquila, Italy
2000 Fuveau, France
2002 Trento, Italy
2004 Chamonix, France
2006 Palermo, Italy
2008 Saint-Etienne, France
2010 Varenna, Italy
2012 Hyeres, France
2014 Cagliari, Italy                                        
Announcement brochure

                                                                                     

Registration procedure

Timetable of presentations

OPEN ACCESS PROCEEDINGS PUBLICATION
with AIP Publishing (included in conference fees)

Note: Please consider that the committee will consider also submission on advanced dielectrics, such as, but not limited to, metal oxides (TiO2, Fe2O3…) other than silica-based materials.

 

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